CEZANNE Make Retouch Base

CEZANNE Make Retouch Base

Release Date
2018.4.24
Size
8.8ml
Brand
CEZANNE
Producer
CEZANNE Cosmetics Co.
Product Type
Makeup Base
Price
¥580
DESCRIPTION

CEZANNE Make Retouch Base is a mattifying Japanese makeup base.

The clear white gel goes on clear and it can be used under or over makeup to mattify and control shine. Its quick-drying formula instantly absorbs into skin to control excess oil for skin that looks matte and silky smooth without feeling dry. Soft-focus powders blur the look of pores for a perfected, beautiful finish. Added menthol and peppermint water give the skin an instant refreshing, tightening effect.

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HOW TO USE

Apply to any area on the face with excess shine using a brush or fingertip.

FULL INGREDIENTS LIST

Water,, alcohol,, dipropylene glycol,, glycerin,, dimethicone/vinyl dimethicone crosspolymer,, silica,, methyl methacrylate crosspolymer,, polymethylsilsesquioxane,, mentha piperita (peppermint) leaf water,, sodium carboxymethyl hyaluronate,, chamomilla recutita (matricaria) flower extract,, salvia officinalis (sage) leaf extract,, ratzillacosme.com do.not.copy,, dipotassium glycyrrhizate,, rosa canina fruit extract,, menthol,, ammonium acryloyldimethyltaurate/VP copolymer,, t-butyl alcohol,, hydroxyethyl acrylate/sodium acryloyldimethyl taurate copolymer,, polysorbate 60,, disodium EDTA,, methylparaben,, ethylparaben,, alumina,, phenoxyethanol,, butylene glycol.

日本語 (JAPANESE)

セザンヌ 皮脂テカリお直し液」の全成分:水、エタノール、DPG、グリセリン、(ジメチコン/ビニルジメチコン)クロスポリマー、シリカ、メタクリル酸メチルクロスポリマー、ポリメチルシルセスキオキサン、ハッカ水、カルボキシメチルヒアルロン酸Na、カミツレ花エキス、セージ葉エキス、グリチルリチン酸2K、カニナバラ果実エキス、メントール、(アクリロイルジメチルタウリンアンモニウム/VP)コポリマー、t-ブタノール、(アクリル酸ヒドロキシエチル/アクリロイルジメチルタウリンNa)コポリマー、スクワラン、ポリソルベート60、EDTA-2Na、メチルパラベン、エチルパラベン、アルミナ、フェノキシエタノール、BG

WORLDWIDE STOCKISTS

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